Ferroelectric thin films by RF sputtering technology

Ferroelectric thin films by RF sputtering technology

A simple hydrogen interface-blocking model is discussed.

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Bibliographic Details
Main Author: Zhu, Weiguang
Other Authors: School of Electrical and Electronic Engineering
Format: Research Report
Published: 2008
Subjects:
DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Online Access:http://hdl.handle.net/10356/2733
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Institution: Nanyang Technological University

Internet

http://hdl.handle.net/10356/2733

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