Fabrication and characterisation of microelectronic devices, circuits and systems III

We present in this report the characterization of deep submicrometer (the device channel length ranges from 0.25um to 1.0um) lightly-doped drain (LDD) pMOSFETs operating in a Bi-MOS structure. The Bi-MOS structure is essentially a device operating with its sourcebody junction forward biased. Cons...

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主要作者: Siek, Liter.
其他作者: School of Electrical and Electronic Engineering
格式: Research Report
出版: 2008
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在線閱讀:http://hdl.handle.net/10356/2754
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