Fabrication and characterisation of microelectronics devices, circuits and system II

The quantum well intermixing (QWI) technique using pulsed-photoabsorption-induced disordering (P-PAID) in the InGaAs/InGaAsP material system has been investigated.

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Bibliographic Details
Main Author:	Zhang, Dao Hua
Other Authors:	School of Electrical and Electronic Engineering
Format:	Research Report
Published:	2008
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Online Access:	http://hdl.handle.net/10356/2866
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Institution:	Nanyang Technological University

id	sg-ntu-dr.10356-2866
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spelling	sg-ntu-dr.10356-28662023-03-04T03:20:28Z Fabrication and characterisation of microelectronics devices, circuits and system II Zhang, Dao Hua School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Microelectronics The quantum well intermixing (QWI) technique using pulsed-photoabsorption-induced disordering (P-PAID) in the InGaAs/InGaAsP material system has been investigated. RGM 14/99 2008-09-17T09:16:00Z 2008-09-17T09:16:00Z 2003 2003 Research Report http://hdl.handle.net/10356/2866 Nanyang Technological University application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
topic	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
spellingShingle	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics Zhang, Dao Hua Fabrication and characterisation of microelectronics devices, circuits and system II
description	The quantum well intermixing (QWI) technique using pulsed-photoabsorption-induced disordering (P-PAID) in the InGaAs/InGaAsP material system has been investigated.
author2	School of Electrical and Electronic Engineering
author_facet	School of Electrical and Electronic Engineering Zhang, Dao Hua
format	Research Report
author	Zhang, Dao Hua
author_sort	Zhang, Dao Hua
title	Fabrication and characterisation of microelectronics devices, circuits and system II
title_short	Fabrication and characterisation of microelectronics devices, circuits and system II
title_full	Fabrication and characterisation of microelectronics devices, circuits and system II
title_fullStr	Fabrication and characterisation of microelectronics devices, circuits and system II
title_full_unstemmed	Fabrication and characterisation of microelectronics devices, circuits and system II
title_sort	fabrication and characterisation of microelectronics devices, circuits and system ii
publishDate	2008
url	http://hdl.handle.net/10356/2866
_version_	1759854045944610816

Fabrication and characterisation of microelectronics devices, circuits and system II

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