Plasma radiation sources for X-ray lithography and neutron analysis applications

• Main Authors: Lee, Sing, Wong, Terence Kin Shun, Feng, Xianping, Lee, Paul Choon Keat, Springham, Stuart V., Serban, Adrian, Liu, Mahe, Kudryashov, Vladimir, Gribkov, Vladimir A., Rajdeep Singh Rawat
• Other Authors: School of Electrical and Electronic Engineering
• Format: Research Report
• Published: 2008
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
• Online Access: http://hdl.handle.net/10356/3020
• Institution: Nanyang Technological University

The main aim of this project was to develop soft x-ray point sources of sufficient power for application in SXR microelectronics lithography. The stated objective was to deliver l00-200W of SXR power, averaged over several minutes of burst duration, from a point source into 47~. The source was to be based on a plasma focus. The second aim of this project was to carry out a feasibility study of the use of plasma fusion neutrons for activation analysis applications.