Properties of amorphous Si-carbon alloy film deposited by FCVA technique

Properties of amorphous Si-carbon alloy film deposited by FCVA technique

Amorphous silicon-carbon alloy (a-Sii-xCx) has attracted much attention not only due to the composition dependent variability of their optical band gap but also because of their important roles as intermediate layer for the growth of diamond film on crystalline silicon and non-diamond substrates. [1...

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Bibliographic Details
Main Author: Tan, Wee Ming
Other Authors: Tay, Beng Kang
Format: Theses and Dissertations
Published: 2008
Subjects:
DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
Online Access:http://hdl.handle.net/10356/3399
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Institution: Nanyang Technological University
Description
Summary:Amorphous silicon-carbon alloy (a-Sii-xCx) has attracted much attention not only due to the composition dependent variability of their optical band gap but also because of their important roles as intermediate layer for the growth of diamond film on crystalline silicon and non-diamond substrates. [1]

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