Rare earth oxide for nanoelectronics

Rare earth oxide for nanoelectronics

This project primarily focus is on investigating whether the introduction of a passivation layer would allow for the formation of a more uniform coating on the Si substrate surface. The thin films are used in various devices such as metal-oxide-semiconductor (CMOS) transistors. The scaling down of...

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書目詳細資料
主要作者:	Lim, Iris Li Hwang.
其他作者:	School of Materials Science and Engineering
格式:	Final Year Project
語言:	English
出版:	2010
主題:	DRNTU::Engineering
在線閱讀:	http://hdl.handle.net/10356/36178
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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