Studies of electrical and optoelectronic properties of Ge-ion-implanted SiO2 thin films

This thesis presents a systematic investigation on the electrical and optoelectronic properties of SiO2 thin films embedded with Ge nanocrystals (nc-Ge) synthesized by the low-energy ion implantation technique for the applications in non-volatile memories and light-emitting devices. First of all, di...

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Bibliographic Details
Main Author: Yang, Ming
Other Authors: Chen Tupei
Format: Theses and Dissertations
Language:English
Published: 2010
Subjects:
Online Access:https://hdl.handle.net/10356/40793
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Institution: Nanyang Technological University
Language: English