Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications

Its primary objective was to investigate the use of the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique to deposit amorphous and microcrystalline hydrogenated silicon carbide films (SiC:H) with a view for the eventual use of such films for optoelectronic applications.

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Bibliographic Details
Main Author: Yoon, Soon Fatt.
Other Authors: School of Electrical and Electronic Engineering
Format: Research Report
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/3016
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Institution: Nanyang Technological University