Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications

Its primary objective was to investigate the use of the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique to deposit amorphous and microcrystalline hydrogenated silicon carbide films (SiC:H) with a view for the eventual use of such films for optoelectronic applications.

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Bibliographic Details
Main Author:	Yoon, Soon Fatt.
Other Authors:	School of Electrical and Electronic Engineering
Format:	Research Report
Published:	2008
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
Online Access:	http://hdl.handle.net/10356/3016
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Institution:	Nanyang Technological University

id	sg-ntu-dr.10356-3016
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spelling	sg-ntu-dr.10356-30162023-03-04T03:19:48Z Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications Yoon, Soon Fatt. School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics Its primary objective was to investigate the use of the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique to deposit amorphous and microcrystalline hydrogenated silicon carbide films (SiC:H) with a view for the eventual use of such films for optoelectronic applications. 2008-09-17T09:18:53Z 2008-09-17T09:18:53Z 1999 1999 Research Report http://hdl.handle.net/10356/3016 Nanyang Technological University application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
topic	DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
spellingShingle	DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics Yoon, Soon Fatt. Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications
description	Its primary objective was to investigate the use of the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique to deposit amorphous and microcrystalline hydrogenated silicon carbide films (SiC:H) with a view for the eventual use of such films for optoelectronic applications.
author2	School of Electrical and Electronic Engineering
author_facet	School of Electrical and Electronic Engineering Yoon, Soon Fatt.
format	Research Report
author	Yoon, Soon Fatt.
author_sort	Yoon, Soon Fatt.
title	Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications
title_short	Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications
title_full	Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications
title_fullStr	Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications
title_full_unstemmed	Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications
title_sort	development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications
publishDate	2008
url	http://hdl.handle.net/10356/3016
_version_	1759853558999547904

Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications

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