Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications
Its primary objective was to investigate the use of the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique to deposit amorphous and microcrystalline hydrogenated silicon carbide films (SiC:H) with a view for the eventual use of such films for optoelectronic applications.
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| 格式: | Research Report |
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2008
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| 在線閱讀: | http://hdl.handle.net/10356/3016 |
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