Characterization of nanostructured memory

An Al-rich aluminum nitride (AlN) thin film is deposited on a p-type silicon substrate by radio frequency (RF) sputtering, rapid thermal annealing (RTA) and electron beam physical vapor deposition (E-beam PVD) to form Al/Al-rich AlN/p-Si diodes. Al nanocrystals (nc-Al) are found to be embedded in t...

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Bibliographic Details
Main Author: Wong, Hian Choy.
Other Authors: Chen Tupei
Format: Final Year Project
Language:English
Published: 2010
Subjects:
Online Access:http://hdl.handle.net/10356/40915
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Institution: Nanyang Technological University
Language: English