Characterization of nanostructured memory
An Al-rich aluminum nitride (AlN) thin film is deposited on a p-type silicon substrate by radio frequency (RF) sputtering, rapid thermal annealing (RTA) and electron beam physical vapor deposition (E-beam PVD) to form Al/Al-rich AlN/p-Si diodes. Al nanocrystals (nc-Al) are found to be embedded in t...
Saved in:
Main Author: | |
---|---|
Other Authors: | |
Format: | Final Year Project |
Language: | English |
Published: |
2010
|
Subjects: | |
Online Access: | http://hdl.handle.net/10356/40915 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
Language: | English |
Be the first to leave a comment!