Application of phase shift masking to sub-micron contact level lithography

• المؤلف الرئيسي: Choo, Lay Cheng.
• مؤلفون آخرون: Tam, Siu Chung
• التنسيق: Theses and Dissertations
• منشور في: 2008
• الموضوعات: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
• الوصول للمادة أونلاين: http://hdl.handle.net/10356/4158
• المؤسسة: Nanyang Technological University

As device continues to shrink beyond the theoretical limit of the optical exposure tools, other options need to be considered. Resolution Enhancement Techniques (RET), such as Phase Shift Mask (PSM), Optical Proximity Correction (OPC) and / or Off Axis Illumination (OAI) will be required. Various ty...