Investigation into optical nanolithography employing wavefront engineering techniques and evanescent waves interference
Optical lithography is an important process in the realization and advancement of nanotechnology. This thesis proposes and investigates potential approaches to ameliorate process issues associated to patterning at high resolution as well as to achieve patterning resolution beyond fundamental limitat...
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| 格式: | Theses and Dissertations |
| 語言: | English |
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2010
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| 在線閱讀: | https://hdl.handle.net/10356/41659 |
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