Investigation into optical nanolithography employing wavefront engineering techniques and evanescent waves interference

Optical lithography is an important process in the realization and advancement of nanotechnology. This thesis proposes and investigates potential approaches to ameliorate process issues associated to patterning at high resolution as well as to achieve patterning resolution beyond fundamental limitat...

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Bibliographic Details
Main Author: Chua, Jeun Kee
Other Authors: Murukeshan Vadakke Matham
Format: Theses and Dissertations
Language:English
Published: 2010
Subjects:
Online Access:https://hdl.handle.net/10356/41659
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Institution: Nanyang Technological University
Language: English

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