Self-aligned nanolithography by selective polymer dissolution

Self-aligned nanolithography by selective polymer dissolution

10.1039/c0nr00398k

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Bibliographic Details
Main Authors: Zhang, H., Wong, C.-L., Hao, Y., Wang, R., Liu, X., Stellacci, F., Thong, J.T.L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/57357
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/57357

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