Self-aligned nanolithography by selective polymer dissolution
10.1039/c0nr00398k
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2014
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sg-nus-scholar.10635-573572023-10-30T10:27:12Z Self-aligned nanolithography by selective polymer dissolution Zhang, H. Wong, C.-L. Hao, Y. Wang, R. Liu, X. Stellacci, F. Thong, J.T.L. ELECTRICAL & COMPUTER ENGINEERING CHEMISTRY 10.1039/c0nr00398k Nanoscale 2 10 2302-2306 2014-06-17T03:05:15Z 2014-06-17T03:05:15Z 2010-10 Article Zhang, H., Wong, C.-L., Hao, Y., Wang, R., Liu, X., Stellacci, F., Thong, J.T.L. (2010-10). Self-aligned nanolithography by selective polymer dissolution. Nanoscale 2 (10) : 2302-2306. ScholarBank@NUS Repository. https://doi.org/10.1039/c0nr00398k 20403364 http://scholarbank.nus.edu.sg/handle/10635/57357 000282686200060 Scopus |
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National University of Singapore |
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Asia |
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Singapore Singapore |
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| description |
10.1039/c0nr00398k |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Zhang, H. Wong, C.-L. Hao, Y. Wang, R. Liu, X. Stellacci, F. Thong, J.T.L. |
| format |
Article |
| author |
Zhang, H. Wong, C.-L. Hao, Y. Wang, R. Liu, X. Stellacci, F. Thong, J.T.L. |
| spellingShingle |
Zhang, H. Wong, C.-L. Hao, Y. Wang, R. Liu, X. Stellacci, F. Thong, J.T.L. Self-aligned nanolithography by selective polymer dissolution |
| author_sort |
Zhang, H. |
| title |
Self-aligned nanolithography by selective polymer dissolution |
| title_short |
Self-aligned nanolithography by selective polymer dissolution |
| title_full |
Self-aligned nanolithography by selective polymer dissolution |
| title_fullStr |
Self-aligned nanolithography by selective polymer dissolution |
| title_full_unstemmed |
Self-aligned nanolithography by selective polymer dissolution |
| title_sort |
self-aligned nanolithography by selective polymer dissolution |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/57357 |
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1781781394054184960 |