Self-aligned nanolithography by selective polymer dissolution
10.1039/c0nr00398k
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Main Authors: | Zhang, H., Wong, C.-L., Hao, Y., Wang, R., Liu, X., Stellacci, F., Thong, J.T.L. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/57357 |
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Institution: | National University of Singapore |
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