Investigation into optical nanolithography employing wavefront engineering techniques and evanescent waves interference

• المؤلف الرئيسي: Chua, Jeun Kee
• مؤلفون آخرون: Murukeshan Vadakke Matham
• التنسيق: Theses and Dissertations
• اللغة: English
• منشور في: 2010
• الموضوعات: DRNTU::Engineering::Nanotechnology
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/41659
• المؤسسة: Nanyang Technological University

Optical lithography is an important process in the realization and advancement of nanotechnology. This thesis proposes and investigates potential approaches to ameliorate process issues associated to patterning at high resolution as well as to achieve patterning resolution beyond fundamental limitat...