Nano-scale characterization of advanced gate stacks using transmission electron microscopy and electron energy loss spectroscopy

• المؤلف الرئيسي: Li, Xiang
• مؤلفون آخرون: Pey Kin Leong
• التنسيق: Theses and Dissertations
• اللغة: English
• منشور في: 2010
• الموضوعات: DRNTU::Engineering::Electrical and electronic engineering::Nanoelectronics
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/42369

This thesis introduces the characterization methodologies which bridge microscopic properties of material change with macroscopic characteristics of a semiconductor device. The objective is to decode the nature of the insulator-to-conductor transition of the gate dielectrics when a leakage path is f...