Report on industrial attachment with Chartered Semiconductor Manufacturing

• Main Author: Tan, Huey Chian.
• Other Authors: Li Lain-Jong
• Format: Industrial Attachment (IA)
• Language: English
• Published: 2010
• Subjects: DRNTU::Engineering::Materials
• Online Access: http://hdl.handle.net/10356/42413
• Institution: Nanyang Technological University

Physical vapor deposition (PVD) is a general term used to describe variety of methods to deposit thin films by the condensation of a vaporized form of the material onto various surfaces. Endura machine is used in PVD process to deposit metals onto semiconductor wafers. The purpose of this report is...