Report on industrial attachment with Chartered Semiconductor Manufacturing
Physical vapor deposition (PVD) is a general term used to describe variety of methods to deposit thin films by the condensation of a vaporized form of the material onto various surfaces. Endura machine is used in PVD process to deposit metals onto semiconductor wafers. The purpose of this report is...
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Main Author: | Tan, Huey Chian. |
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Other Authors: | Li Lain-Jong |
Format: | Industrial Attachment (IA) |
Language: | English |
Published: |
2010
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Subjects: | |
Online Access: | http://hdl.handle.net/10356/42413 |
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Institution: | Nanyang Technological University |
Language: | English |
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