Deposition and characterization of metal-containing carbon (Me-c:h) films
The main objectives of this study are to deposit the above three Me-C:H, W-C:H, Mo-C:H and Ni-C:H films at different deposition conditions using our ECR-CVD system with a screen grid design and to conduct a comprehensive investigation in the three Me-C:H films.
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| Format: | Theses and Dissertations |
| Published: |
2008
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| Online Access: | http://hdl.handle.net/10356/4397 |
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| Institution: | Nanyang Technological University |
| Summary: | The main objectives of this study are to deposit the above three Me-C:H, W-C:H, Mo-C:H and Ni-C:H films at different deposition conditions using our ECR-CVD system with a screen grid design and to conduct a comprehensive investigation in the three Me-C:H films. |
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