Deposition and characterization of metal-containing carbon (Me-c:h) films

Deposition and characterization of metal-containing carbon (Me-c:h) films

The main objectives of this study are to deposit the above three Me-C:H, W-C:H, Mo-C:H and Ni-C:H films at different deposition conditions using our ECR-CVD system with a screen grid design and to conduct a comprehensive investigation in the three Me-C:H films.

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Bibliographic Details
Main Author: Huang, Qingfeng.
Other Authors: Yoon, Soon Fatt
Format: Theses and Dissertations
Published: 2008
Subjects:
DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
Online Access:http://hdl.handle.net/10356/4397
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Institution: Nanyang Technological University
id sg-ntu-dr.10356-4397
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spelling sg-ntu-dr.10356-43972023-07-04T15:43:07Z Deposition and characterization of metal-containing carbon (Me-c:h) films Huang, Qingfeng. Yoon, Soon Fatt School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials The main objectives of this study are to deposit the above three Me-C:H, W-C:H, Mo-C:H and Ni-C:H films at different deposition conditions using our ECR-CVD system with a screen grid design and to conduct a comprehensive investigation in the three Me-C:H films. Doctor of Philosophy (EEE) 2008-09-17T09:50:42Z 2008-09-17T09:50:42Z 2002 2002 Thesis http://hdl.handle.net/10356/4397 Nanyang Technological University application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
topic DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
spellingShingle DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
Huang, Qingfeng.
Deposition and characterization of metal-containing carbon (Me-c:h) films
description The main objectives of this study are to deposit the above three Me-C:H, W-C:H, Mo-C:H and Ni-C:H films at different deposition conditions using our ECR-CVD system with a screen grid design and to conduct a comprehensive investigation in the three Me-C:H films.
author2 Yoon, Soon Fatt
author_facet Yoon, Soon Fatt
Huang, Qingfeng.
format Theses and Dissertations
author Huang, Qingfeng.
author_sort Huang, Qingfeng.
title Deposition and characterization of metal-containing carbon (Me-c:h) films
title_short Deposition and characterization of metal-containing carbon (Me-c:h) films
title_full Deposition and characterization of metal-containing carbon (Me-c:h) films
title_fullStr Deposition and characterization of metal-containing carbon (Me-c:h) films
title_full_unstemmed Deposition and characterization of metal-containing carbon (Me-c:h) films
title_sort deposition and characterization of metal-containing carbon (me-c:h) films
publishDate 2008
url http://hdl.handle.net/10356/4397
_version_ 1772826043849113600

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