Optimized processing of ridge waveguide semiconductor lasers

• Main Author: Tern, Roger Poh Cher.
• Other Authors: Yoon Soon Fatt
• Format: Final Year Project
• Language: English
• Published: 2011
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
• Online Access: http://hdl.handle.net/10356/44943
• Institution: Nanyang Technological University

Quantum Cascaded Lasers are small semiconductor lasers which emits light ranging from mid to far infrared potion of the wavelength spectrum. It is different from conventional diode laser where the emission wavelength depends on the bandgap and there are two main feature that are unique to QCL which uses the cascaded process, where it allows the recycling of the same electron. Furthermore, the QCL contains a series of quantum wells where the emission wavelength can be varied by changing the thickness of quantum well layers. [1] This report explores the various approach and obstacles involved in fabricating a semiconductor Mid-IR Quantum Cascaded Laser. Process which involve machines such as the Reactive Ion Etchnig Machine (RIE), Inductive Coupling Plasma Machine (ICP), Plasma Enhanced Chemical Vapor Deposition Machine (PECVD), E-Beam Machine, Ultra-Sonic Machine, Spin Coater, and Contact-Photolithography Machine.