Process integration issues in the development of 0.18um 1.8v LP SRAM using local interconnect

This dissertation presents the development issues encountered during the present development of 0.18um LP (low-power) SRAM in Chartered Semiconductor Manufacturing Lid. All integration issues are explained with data and cross-sectional scanning electron micrographs for better explanation

Saved in:
Bibliographic Details
Main Author: Lal, Manni
Other Authors: Lau, Wai Shing
Format: Theses and Dissertations
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/4553
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Be the first to leave a comment!
You must be logged in first