Process integration issues in the development of 0.18um 1.8v LP SRAM using local interconnect
This dissertation presents the development issues encountered during the present development of 0.18um LP (low-power) SRAM in Chartered Semiconductor Manufacturing Lid. All integration issues are explained with data and cross-sectional scanning electron micrographs for better explanation
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Main Author: | Lal, Manni |
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Other Authors: | Lau, Wai Shing |
Format: | Theses and Dissertations |
Published: |
2008
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Subjects: | |
Online Access: | http://hdl.handle.net/10356/4553 |
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Institution: | Nanyang Technological University |
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