Optimizing of TiN barrier properties for CNT interconnects

• Main Author: Ng, Anthony Tian Shi
• Other Authors: Tay Beng Kang
• Format: Final Year Project
• Language: English
• Published: 2012
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
• Online Access: http://hdl.handle.net/10356/50111
• Institution: Nanyang Technological University

This report aims to investigate the various parameters on optimizing of the Titanium Nitride (TiN) thin films to achieve low resistivity, fabrication of four point probe flip chip design and measurement of the flip chip interconnection resistance. Three controlled parameters are experimented in the...