Optimizing of TiN barrier properties for CNT interconnects

• 主要作者: Ng, Anthony Tian Shi
• 其他作者: Tay Beng Kang
• 格式: Final Year Project
• 語言: English
• 出版: 2012
• 主題: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
• 在線閱讀: http://hdl.handle.net/10356/50111
• 機構: Nanyang Technological University

This report aims to investigate the various parameters on optimizing of the Titanium Nitride (TiN) thin films to achieve low resistivity, fabrication of four point probe flip chip design and measurement of the flip chip interconnection resistance. Three controlled parameters are experimented in the...