Study of chemical vapor deposited carbon nanotubes as electrical interconnect

• المؤلف الرئيسي: Ng, Chou Shing
• مؤلفون آخرون: Tay Beng Kang
• التنسيق: Final Year Project
• اللغة: English
• منشور في: 2013
• الموضوعات: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
• الوصول للمادة أونلاين: http://hdl.handle.net/10356/53535
• المؤسسة: Nanyang Technological University

This report aims to optimize the thickness of the Titanium/ Titanium Nitride (Ti/TiN) and Aluminum/Aluminum Oxide (Al/Al2O3) thin films in order to achieve a suitable compromise between the growth of the carbon nanotube as well as high conductivity. Experiments are conducted with various thicknesses...