Study of chemical vapor deposited carbon nanotubes as electrical interconnect

This report aims to optimize the thickness of the Titanium/ Titanium Nitride (Ti/TiN) and Aluminum/Aluminum Oxide (Al/Al2O3) thin films in order to achieve a suitable compromise between the growth of the carbon nanotube as well as high conductivity. Experiments are conducted with various thicknesses...

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Bibliographic Details
Main Author: Ng, Chou Shing
Other Authors: Tay Beng Kang
Format: Final Year Project
Language:English
Published: 2013
Subjects:
Online Access:http://hdl.handle.net/10356/53535
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Institution: Nanyang Technological University
Language: English
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