Investigations into plasmonic lithography concepts for high resolution nanoscale feature patterning

• Main Author: Sreekanth Kandammathe Valiyaveedu
• Other Authors: Murukeshan Vadakke Matham
• Format: Theses and Dissertations
• Language: English
• Published: 2012
• Subjects: DRNTU::Engineering::Aeronautical engineering; DRNTU::Engineering::Mechanical engineering
• Online Access: https://hdl.handle.net/10356/48682
• Institution: Nanyang Technological University

Plasmonic lithography, which is not restricted by free space diffraction limit, is one of the potential research thrust areas as it offers the possibility for high resolution nanopatterning. This thesis investigates novel concepts and relative configurations of plasmonic lithography to fabricate nan...