Investigations into plasmonic lithography concepts for high resolution nanoscale feature patterning

Plasmonic lithography, which is not restricted by free space diffraction limit, is one of the potential research thrust areas as it offers the possibility for high resolution nanopatterning. This thesis investigates novel concepts and relative configurations of plasmonic lithography to fabricate nan...

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Bibliographic Details
Main Author: Sreekanth Kandammathe Valiyaveedu
Other Authors: Murukeshan Vadakke Matham
Format: Theses and Dissertations
Language:English
Published: 2012
Subjects:
Online Access:https://hdl.handle.net/10356/48682
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Institution: Nanyang Technological University
Language: English

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