Characterization of flicker noise in sub-micron NMOS device

Nowadays MOS device sizes and signal levels are aggressively scaled down, the low-frequency noise (LFN) properties become increasingly important. This is because the signals are no longer significantly higher than the LFN, especially since the LFN level increases significantly as the device's s...

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Bibliographic Details
Main Author: Myo Thant Win.
Other Authors: Yeo, Kiat Seng
Format: Theses and Dissertations
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/4919
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Institution: Nanyang Technological University