Surface modification of nanoscale energy electrodes using atomic layer deposition.

• المؤلف الرئيسي: Hay, Zao Hiong.
• مؤلفون آخرون: School of Physical and Mathematical Sciences
• التنسيق: Final Year Project
• اللغة: English
• منشور في: 2012
• الموضوعات: DRNTU::Science
• الوصول للمادة أونلاين: http://hdl.handle.net/10356/49480
• المؤسسة: Nanyang Technological University

In this thesis, the use of atomic layer deposition (ALD) was applied on hydrothermally grown rutile-TiO2 nanorods on fluorine-doped tin oxide (FTO), cultivating a nanorod array of anatase-rutile TiO2 heterojunctions. Thickness of the ALD thin film for optimal photocurrent generation and electron tra...