Surface modification of nanoscale energy electrodes using atomic layer deposition.

In this thesis, the use of atomic layer deposition (ALD) was applied on hydrothermally grown rutile-TiO2 nanorods on fluorine-doped tin oxide (FTO), cultivating a nanorod array of anatase-rutile TiO2 heterojunctions. Thickness of the ALD thin film for optimal photocurrent generation and electron tra...

Full description

Saved in:
Bibliographic Details
Main Author: Hay, Zao Hiong.
Other Authors: School of Physical and Mathematical Sciences
Format: Final Year Project
Language:English
Published: 2012
Subjects:
Online Access:http://hdl.handle.net/10356/49480
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Language: English