Surface modification of nanoscale energy electrodes using atomic layer deposition.

Surface modification of nanoscale energy electrodes using atomic layer deposition.

In this thesis, the use of atomic layer deposition (ALD) was applied on hydrothermally grown rutile-TiO2 nanorods on fluorine-doped tin oxide (FTO), cultivating a nanorod array of anatase-rutile TiO2 heterojunctions. Thickness of the ALD thin film for optimal photocurrent generation and electron tra...

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Bibliographic Details
Main Author: Hay, Zao Hiong.
Other Authors: School of Physical and Mathematical Sciences
Format: Final Year Project
Language:English
Published: 2012
Subjects:
DRNTU::Science
Online Access:http://hdl.handle.net/10356/49480
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Institution: Nanyang Technological University
Language: English
Description
Summary:In this thesis, the use of atomic layer deposition (ALD) was applied on hydrothermally grown rutile-TiO2 nanorods on fluorine-doped tin oxide (FTO), cultivating a nanorod array of anatase-rutile TiO2 heterojunctions. Thickness of the ALD thin film for optimal photocurrent generation and electron transport properties was determined through a series of photoelectrochemical tests and reflectivity and quantum efficiency (QE) plots. A visual understanding of the nanostructures was achieved through SEM images. Further hydrothermal growth after ALD was attempted with some success.

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