Surface modification of nanoscale energy electrodes using atomic layer deposition.

In this thesis, the use of atomic layer deposition (ALD) was applied on hydrothermally grown rutile-TiO2 nanorods on fluorine-doped tin oxide (FTO), cultivating a nanorod array of anatase-rutile TiO2 heterojunctions. Thickness of the ALD thin film for optimal photocurrent generation and electron tra...

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Main Author:	Hay, Zao Hiong.
Other Authors:	School of Physical and Mathematical Sciences
Format:	Final Year Project
Language:	English
Published:	2012
Subjects:	DRNTU::Science
Online Access:	http://hdl.handle.net/10356/49480
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Institution:	Nanyang Technological University
Language:	English

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record_format	dspace
spelling	sg-ntu-dr.10356-494802023-02-28T23:19:29Z Surface modification of nanoscale energy electrodes using atomic layer deposition. Hay, Zao Hiong. School of Physical and Mathematical Sciences Fan Hongjin DRNTU::Science In this thesis, the use of atomic layer deposition (ALD) was applied on hydrothermally grown rutile-TiO2 nanorods on fluorine-doped tin oxide (FTO), cultivating a nanorod array of anatase-rutile TiO2 heterojunctions. Thickness of the ALD thin film for optimal photocurrent generation and electron transport properties was determined through a series of photoelectrochemical tests and reflectivity and quantum efficiency (QE) plots. A visual understanding of the nanostructures was achieved through SEM images. Further hydrothermal growth after ALD was attempted with some success. Bachelor of Science in Physics 2012-05-21T01:56:14Z 2012-05-21T01:56:14Z 2012 2012 Final Year Project (FYP) http://hdl.handle.net/10356/49480 en 54 p. application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
language	English
topic	DRNTU::Science
spellingShingle	DRNTU::Science Hay, Zao Hiong. Surface modification of nanoscale energy electrodes using atomic layer deposition.
description	In this thesis, the use of atomic layer deposition (ALD) was applied on hydrothermally grown rutile-TiO2 nanorods on fluorine-doped tin oxide (FTO), cultivating a nanorod array of anatase-rutile TiO2 heterojunctions. Thickness of the ALD thin film for optimal photocurrent generation and electron transport properties was determined through a series of photoelectrochemical tests and reflectivity and quantum efficiency (QE) plots. A visual understanding of the nanostructures was achieved through SEM images. Further hydrothermal growth after ALD was attempted with some success.
author2	School of Physical and Mathematical Sciences
author_facet	School of Physical and Mathematical Sciences Hay, Zao Hiong.
format	Final Year Project
author	Hay, Zao Hiong.
author_sort	Hay, Zao Hiong.
title	Surface modification of nanoscale energy electrodes using atomic layer deposition.
title_short	Surface modification of nanoscale energy electrodes using atomic layer deposition.
title_full	Surface modification of nanoscale energy electrodes using atomic layer deposition.
title_fullStr	Surface modification of nanoscale energy electrodes using atomic layer deposition.
title_full_unstemmed	Surface modification of nanoscale energy electrodes using atomic layer deposition.
title_sort	surface modification of nanoscale energy electrodes using atomic layer deposition.
publishDate	2012
url	http://hdl.handle.net/10356/49480
_version_	1759858229675819008

Surface modification of nanoscale energy electrodes using atomic layer deposition.

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