Development of pulsed laser deposition system
Pulsed Laser Deposition (PLD) is an emerging technology, which is versatile tool for thin-film research. From the first found in years 1980’s, PLD system has received an intensive development due to its wide-range application in various areas of thin-film and multilayer research. The advantages of P...
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| Format: | Final Year Project |
| Language: | English |
| Published: |
2012
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| Online Access: | http://hdl.handle.net/10356/49693 |
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| Institution: | Nanyang Technological University |
| Language: | English |
| Summary: | Pulsed Laser Deposition (PLD) is an emerging technology, which is versatile tool for thin-film research. From the first found in years 1980’s, PLD system has received an intensive development due to its wide-range application in various areas of thin-film and multilayer research. The advantages of PLD system including the simplicity of the system and the ease of using external pulsed laser, which enable it to be used widely in thin-film deposition with different materials, stoichiometric transfer, fabricating artificially layered materials as well as metastable phases…
In this project, a PLD system has been developed to enable researchers to prepare nano thin-films at different temperature conditions. An application in fabricating textured Carbon thin-film using this PLD system has been achieved. The result of this research in thin-film fabrication offers opportunity in new methodology of textured Carbon preparation technique. |
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