Development and integration of new ultra low k materials & processes for high reliability microelectronics
The project will focus on the integration of the ultra low k materials into advanced silicon processes so as to yield highly reliable devices to meet the requirements of next generation integrated circuits. Reliability initiatives will include phenomenon such as stress and electro migration, time de...
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| 格式: | Research Report |
| 出版: |
2008
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| 在線閱讀: | http://hdl.handle.net/10356/5033 |
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