Processing and characterization of low-k materials for ULSI application

• Main Author: Widodo, Johnny.
• Other Authors: Mhaisalkar, Subodh Gautam
• Format: Theses and Dissertations
• Published: 2008
• Subjects: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects
• Online Access: http://hdl.handle.net/10356/5060
• Institution: Nanyang Technological University

In this project, chemical vapor deposited carbon doped oxide films, with dielectric constants in the range of 2.7 to 3.5 were studied.