Processing and characterization of low-k materials for ULSI application

In this project, chemical vapor deposited carbon doped oxide films, with dielectric constants in the range of 2.7 to 3.5 were studied.

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Bibliographic Details
Main Author:	Widodo, Johnny.
Other Authors:	Mhaisalkar, Subodh Gautam
Format:	Theses and Dissertations
Published:	2008
Subjects:	DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects
Online Access:	http://hdl.handle.net/10356/5060
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Institution:	Nanyang Technological University

id	sg-ntu-dr.10356-5060
record_format	dspace
spelling	sg-ntu-dr.10356-50602023-03-04T16:31:19Z Processing and characterization of low-k materials for ULSI application Widodo, Johnny. Mhaisalkar, Subodh Gautam School of Materials Science & Engineering DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects In this project, chemical vapor deposited carbon doped oxide films, with dielectric constants in the range of 2.7 to 3.5 were studied. Master of Engineering (SME) 2008-09-17T10:18:53Z 2008-09-17T10:18:53Z 2004 2004 Thesis http://hdl.handle.net/10356/5060 Nanyang Technological University 108 p. application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
topic	DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects
spellingShingle	DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects Widodo, Johnny. Processing and characterization of low-k materials for ULSI application
description	In this project, chemical vapor deposited carbon doped oxide films, with dielectric constants in the range of 2.7 to 3.5 were studied.
author2	Mhaisalkar, Subodh Gautam
author_facet	Mhaisalkar, Subodh Gautam Widodo, Johnny.
format	Theses and Dissertations
author	Widodo, Johnny.
author_sort	Widodo, Johnny.
title	Processing and characterization of low-k materials for ULSI application
title_short	Processing and characterization of low-k materials for ULSI application
title_full	Processing and characterization of low-k materials for ULSI application
title_fullStr	Processing and characterization of low-k materials for ULSI application
title_full_unstemmed	Processing and characterization of low-k materials for ULSI application
title_sort	processing and characterization of low-k materials for ulsi application
publishDate	2008
url	http://hdl.handle.net/10356/5060
_version_	1759857861954895872

Processing and characterization of low-k materials for ULSI application

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