Process development for PECVD equipment

• Main Author: Yang, Jian Jun
• Other Authors: Miao, Jianmin
• Format: Theses and Dissertations
• Published: 2008
• Subjects: DRNTU::Engineering::Manufacturing::Production management
• Online Access: http://hdl.handle.net/10356/5448
• Institution: Nanyang Technological University

Process for depositing silicon nitride film by using Micro-90011 PECVD system has been developed. The stress test structure simulation, fabrication and system performance improvement have been studied in the project. The studies are carried out stress measurements at a device level by using micromac...