Gate-all-around silicon nanowire FET modeling

As a further extension of the multi-gate MOSFET, the gate-all-around (GAA) silicon nanowire FET is the most promising nanostructure design for next generation semiconductor device. Recent research work demonstrates the excellent device performance of GAA silicon nanowire FET, especially the gate con...

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Bibliographic Details
Main Author: Chen, Xiangchen
Other Authors: Tan Cher Ming
Format: Theses and Dissertations
Language:English
Published: 2014
Subjects:
Online Access:https://hdl.handle.net/10356/59526
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Institution: Nanyang Technological University
Language: English
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