Novel system for direct writing of binary photomask using femtosecond laser

Novel system for direct writing of binary photomask using femtosecond laser

Photomask is the backbone of semiconductor and other microfabrication industries. It is a high precision plate containing microscopic images of the miniaturized devices to be fabricated. A binary photomask is composed of transparent and opaque elements, which form one layer of a pattern. It is curre...

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Main Author: Stanley, Paul.
Other Authors: School of Mechanical and Production Engineering
Format: Theses and Dissertations
Published: 2008
Subjects:
DRNTU::Engineering::Manufacturing
Online Access:http://hdl.handle.net/10356/6266
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Institution: Nanyang Technological University
id sg-ntu-dr.10356-6266
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spelling sg-ntu-dr.10356-62662023-03-11T17:22:46Z Novel system for direct writing of binary photomask using femtosecond laser Stanley, Paul. School of Mechanical and Production Engineering DRNTU::Engineering::Manufacturing Photomask is the backbone of semiconductor and other microfabrication industries. It is a high precision plate containing microscopic images of the miniaturized devices to be fabricated. A binary photomask is composed of transparent and opaque elements, which form one layer of a pattern. It is currently fabricated by the lithography process which is a complex process involving several steps and hence time consuming. Doctor of Philosophy (MPE) 2008-09-17T11:10:37Z 2008-09-17T11:10:37Z 2004 2004 Thesis http://hdl.handle.net/10356/6266 Nanyang Technological University application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
topic DRNTU::Engineering::Manufacturing
spellingShingle DRNTU::Engineering::Manufacturing
Stanley, Paul.
Novel system for direct writing of binary photomask using femtosecond laser
description Photomask is the backbone of semiconductor and other microfabrication industries. It is a high precision plate containing microscopic images of the miniaturized devices to be fabricated. A binary photomask is composed of transparent and opaque elements, which form one layer of a pattern. It is currently fabricated by the lithography process which is a complex process involving several steps and hence time consuming.
author2 School of Mechanical and Production Engineering
author_facet School of Mechanical and Production Engineering
Stanley, Paul.
format Theses and Dissertations
author Stanley, Paul.
author_sort Stanley, Paul.
title Novel system for direct writing of binary photomask using femtosecond laser
title_short Novel system for direct writing of binary photomask using femtosecond laser
title_full Novel system for direct writing of binary photomask using femtosecond laser
title_fullStr Novel system for direct writing of binary photomask using femtosecond laser
title_full_unstemmed Novel system for direct writing of binary photomask using femtosecond laser
title_sort novel system for direct writing of binary photomask using femtosecond laser
publishDate 2008
url http://hdl.handle.net/10356/6266
_version_ 1761781288800354304

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