Novel system for direct writing of binary photomask using femtosecond laser

• Main Author: Stanley, Paul.
• Other Authors: School of Mechanical and Production Engineering
• Format: Theses and Dissertations
• Published: 2008
• Subjects: DRNTU::Engineering::Manufacturing
• Online Access: http://hdl.handle.net/10356/6266
• Institution: Nanyang Technological University

Photomask is the backbone of semiconductor and other microfabrication industries. It is a high precision plate containing microscopic images of the miniaturized devices to be fabricated. A binary photomask is composed of transparent and opaque elements, which form one layer of a pattern. It is curre...