Amorphous indium gallium zinc oxide thin film transistor and memory device for future device applications

Amorphous Indium Gallium Zinc Oxide (IGZO) is an important material which can be used in transparent thin film transistors (TFTs) due to its high field effect mobility for the next generation flat panel displays. Evolution of electrical properties and TFT characteristics of amorphous IGZO thin films...

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Bibliographic Details
Main Author: Liu, Pan
Other Authors: Chen Tupei
Format: Theses and Dissertations
Language:English
Published: 2015
Subjects:
Online Access:https://hdl.handle.net/10356/63694
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Institution: Nanyang Technological University
Language: English