Magnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughness
This project focuses on the study of hardening and toughening mechanisms for nanocomposite thin films. The aim of this project is to study the relationship between microstructure, hardness and toughness, therefore to obtain a thin film with high hardness and at the same time high toughness. Reactive...
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sg-ntu-dr.10356-64142023-03-11T18:08:24Z Magnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughness Sun, Deen Sam Zhang Shanyong School of Mechanical and Aerospace Engineering DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films This project focuses on the study of hardening and toughening mechanisms for nanocomposite thin films. The aim of this project is to study the relationship between microstructure, hardness and toughness, therefore to obtain a thin film with high hardness and at the same time high toughness. Reactive magnetron sputtering was used to prepare hard and superhard nc-TiN/a-Sinx nanocomposite thin films by co-sputtering Ti and Si3N4 targets in a gas mixture (argon and nitrogen). In order to improve the toughness of the as-prepared nanocomposite thin films, nickel was doped into the nc-TiN/a-SiNx to obtain Niiv toughened nc-TiN/a-SiNx nanocomposite thin films by co-sputtering TiNi, Ti and Si3N4 targets. Co-sputtering of multi targets allows to tailor the microstructure by adjusting the deposition parameters, such as target power density, deposition temperature, substrate bias, and gas ratio. The as-deposited Ni-toughened nc-TiN/a-SiNx nanocomposite thin films possess high hardness and high toughness. DOCTOR OF PHILOSOPHY (MAE) 2008-09-17T11:14:25Z 2008-09-17T11:14:25Z 2005 2005 Thesis Sun, D. (2005). Magnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughness. Doctoral thesis, Nanyang Technological University, Singapore. https://hdl.handle.net/10356/6414 10.32657/10356/6414 Nanyang Technological University application/pdf |
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DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films Sun, Deen Magnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughness |
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This project focuses on the study of hardening and toughening mechanisms for nanocomposite thin films. The aim of this project is to study the relationship between microstructure, hardness and toughness, therefore to obtain a thin film with high hardness and at the same time high toughness. Reactive magnetron sputtering was used to prepare hard and superhard nc-TiN/a-Sinx nanocomposite thin films by co-sputtering Ti and Si3N4 targets in a gas mixture (argon and nitrogen). In order to improve the toughness of the as-prepared nanocomposite thin films, nickel was doped into the nc-TiN/a-SiNx to obtain Niiv toughened nc-TiN/a-SiNx nanocomposite thin films by co-sputtering TiNi, Ti and Si3N4 targets. Co-sputtering of multi targets allows to tailor the microstructure by adjusting the deposition parameters, such as target power density, deposition temperature, substrate bias, and gas ratio. The as-deposited Ni-toughened nc-TiN/a-SiNx nanocomposite thin films possess high hardness and high toughness. |
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Sam Zhang Shanyong |
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Sam Zhang Shanyong Sun, Deen |
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Theses and Dissertations |
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Sun, Deen |
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Sun, Deen |
title |
Magnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughness |
title_short |
Magnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughness |
title_full |
Magnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughness |
title_fullStr |
Magnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughness |
title_full_unstemmed |
Magnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughness |
title_sort |
magnetron sputtered nc-tin/a-sinx nanocomposite thin films with high hardness and high toughness |
publishDate |
2008 |
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https://hdl.handle.net/10356/6414 |
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1761781725996777472 |