Magnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughness

This project focuses on the study of hardening and toughening mechanisms for nanocomposite thin films. The aim of this project is to study the relationship between microstructure, hardness and toughness, therefore to obtain a thin film with high hardness and at the same time high toughness. Reactive...

Full description

Saved in:
Bibliographic Details
Main Author: Sun, Deen
Other Authors: Sam Zhang Shanyong
Format: Theses and Dissertations
Published: 2008
Subjects:
Online Access:https://hdl.handle.net/10356/6414
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
id sg-ntu-dr.10356-6414
record_format dspace
spelling sg-ntu-dr.10356-64142023-03-11T18:08:24Z Magnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughness Sun, Deen Sam Zhang Shanyong School of Mechanical and Aerospace Engineering DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films This project focuses on the study of hardening and toughening mechanisms for nanocomposite thin films. The aim of this project is to study the relationship between microstructure, hardness and toughness, therefore to obtain a thin film with high hardness and at the same time high toughness. Reactive magnetron sputtering was used to prepare hard and superhard nc-TiN/a-Sinx nanocomposite thin films by co-sputtering Ti and Si3N4 targets in a gas mixture (argon and nitrogen). In order to improve the toughness of the as-prepared nanocomposite thin films, nickel was doped into the nc-TiN/a-SiNx to obtain Niiv toughened nc-TiN/a-SiNx nanocomposite thin films by co-sputtering TiNi, Ti and Si3N4 targets. Co-sputtering of multi targets allows to tailor the microstructure by adjusting the deposition parameters, such as target power density, deposition temperature, substrate bias, and gas ratio. The as-deposited Ni-toughened nc-TiN/a-SiNx nanocomposite thin films possess high hardness and high toughness. DOCTOR OF PHILOSOPHY (MAE) 2008-09-17T11:14:25Z 2008-09-17T11:14:25Z 2005 2005 Thesis Sun, D. (2005). Magnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughness. Doctoral thesis, Nanyang Technological University, Singapore. https://hdl.handle.net/10356/6414 10.32657/10356/6414 Nanyang Technological University application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
topic DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
spellingShingle DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Sun, Deen
Magnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughness
description This project focuses on the study of hardening and toughening mechanisms for nanocomposite thin films. The aim of this project is to study the relationship between microstructure, hardness and toughness, therefore to obtain a thin film with high hardness and at the same time high toughness. Reactive magnetron sputtering was used to prepare hard and superhard nc-TiN/a-Sinx nanocomposite thin films by co-sputtering Ti and Si3N4 targets in a gas mixture (argon and nitrogen). In order to improve the toughness of the as-prepared nanocomposite thin films, nickel was doped into the nc-TiN/a-SiNx to obtain Niiv toughened nc-TiN/a-SiNx nanocomposite thin films by co-sputtering TiNi, Ti and Si3N4 targets. Co-sputtering of multi targets allows to tailor the microstructure by adjusting the deposition parameters, such as target power density, deposition temperature, substrate bias, and gas ratio. The as-deposited Ni-toughened nc-TiN/a-SiNx nanocomposite thin films possess high hardness and high toughness.
author2 Sam Zhang Shanyong
author_facet Sam Zhang Shanyong
Sun, Deen
format Theses and Dissertations
author Sun, Deen
author_sort Sun, Deen
title Magnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughness
title_short Magnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughness
title_full Magnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughness
title_fullStr Magnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughness
title_full_unstemmed Magnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughness
title_sort magnetron sputtered nc-tin/a-sinx nanocomposite thin films with high hardness and high toughness
publishDate 2008
url https://hdl.handle.net/10356/6414
_version_ 1761781725996777472