Improved edge uniformity in chemical & mechanical polishing of wafer by means of guide ring pressure using springs

In this project, a new carrier has been proposed via using simple springs to provide the pressurized guide-ring to improve the overall uniformity at a very much affordable cost. The first prototype uses polyphenylene sulfide (PPS) as the material for the rotating carrier. The second prototype uses c...

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Bibliographic Details
Main Author: Tan, Chek Soon.
Other Authors: Zhong, Zhaowei
Format: Theses and Dissertations
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/6436
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Institution: Nanyang Technological University