Characterization of dynamic NBTI by ultra-fast charge pumping and ultra-fast switching method

Till very recently, the most well-known model used to explain the NBTI phenomenon is the reaction-diffusion (R-D) model, which describes the evolution of Si/SiO2 interface states (Nit) contributing to NBTI based on a hydrogen transport mechanism. However, there has been much on-going discussion rega...

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Bibliographic Details
Main Author: Teo, Andy Zhiqiang
Other Authors: Ang Diing Shenp
Format: Theses and Dissertations
Language:English
Published: 2015
Subjects:
Online Access:https://hdl.handle.net/10356/65268
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Institution: Nanyang Technological University
Language: English