Copper nanowires bonding for three dimensional interconnections

Over the past few decades, the semiconductor industry has been advancing by increasing transistor density on a microchip through continuous device scaling based on the technology roadmap driven by Moore’s Law. However, new physical phenomena at scaled dimensions and fundamental limitations in materi...

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Bibliographic Details
Main Author: Chun, Shu Rong
Other Authors: Gan Chee Lip
Format: Theses and Dissertations
Language:English
Published: 2016
Subjects:
Online Access:https://hdl.handle.net/10356/69104
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Institution: Nanyang Technological University
Language: English